Abstract
The use of statistical process control in monitoring and diagnosis of process and product quality profiles remains an important problem in various manufacturing industries. Although the analysis of profile data has been extensively studied in the literature, the challenges associated with monitoring and diagnosis of multiple functional profiles are yet to be well addressed because it is usually difficult to properly model the inter-relationship of multiple profiles. Motivated by a real-data application in semiconductor industries, we develop a new modelling and monitoring framework for Phase-I analysis of multiple profiles. The proposed framework incorporates the regression-adjustment technique into the functional principal component analysis. In this framework, the multiple profiles are treated as multivariate functional observations and their regression-adjusted residuals are used for monitoring. Simulation results show that the proposed method could describe the major structure of profile variation well and effectively find outlying profiles in a historical dataset due to sufficiently utilizing the information on between-profiles correlation.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.