Abstract

The results of the study of structural and phase transformations in the silicon substrate-chromium coating system exposed to compression plasma fluxes with power densities of 0.3–1.2 GW/m2 are discussed. The formation of hexagonal chromium disilicide and an amorphous phase, the growth of silicon dendrites, and the appearance of a chromium-enriched near-surface layer are revealed effects. The mechanisms of structural and phase transformations caused by rapid cooling of a mixed melt and concentration overcooling during solidification are analyzed.

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