Abstract
We have studied the ground state of two-dimensional small-Josephson-junction arrays fabricated by the electron-beam lithography. To control the strength of dissipation, we attach an Ohmic resistor (a Cr thin film) to each Al–AlO x –Al junction. The I– V curve shows a transition from the insulating behavior with the Coulomb gap to the superconducting behavior with DC-Josephson-like current as the shunt resistance decreases. The measured phase diagram is compared with theories of the dissipative phase transition.
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