Abstract
Well-crystallized anatase and mixed (anatase–rutile) phase TiO2 thin films were deposited by DC magnetron sputtering technique at various DC powers in the range of 80–140W. Pure anatase phase was observed in the TiO2 films deposited at low power of 80W. Films deposited at 120 W were composed of both anatase and rutile phases. At higher power of 140W, the films are rutile dominated and the rutile percentage increased from 0 to 82% with increase of DC power. The same results of phase change were confirmed by Raman studies. The surface morphology of the TiO2 films showed that the density of the films increased with increase of sputter power. The optical band gap of the films varied from 3.35 to 3.14eV with increase of DC power. The photocatalytic activity of the TiO2 films increased with increasing DC power up to 120W and after that it decreases. We found that the TiO2 films deposited at 120W with 48% of rutile phase, exhibited high photocatalytic activity (43% of degradation) under UV light compared with other TiO2 films. After loading the optimized Ag nanoparticles on the mixed phase TiO2 films, the photocatalytic activity shifted from UV to visible region with enhancement of photocatalytic activity (55% of degradation).
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