Phase composition of the buried silicon interlayers in the amorphous multilayer nanostructures [(Co45Fe45Zr10)/a‐Si:H]41 and [(Co45Fe45Zr10)35(Al2O3)65/a‐Si:H]41

Abstract

We consider two amorphous multilayer nanostructures (MLNS) [(Co45Fe45Zr10)/a‐Si:H]41–I and [(Co45Fe45Zr10)35(Al2O3)65/a‐Si:H]41–II that were obtained by ion‐beam sputtering. For determination of the phase composition of the buried amorphous silicon interlayers in these MLNS, we used nondestructive ultrasoft X‐ray emission spectroscopy technique (USXES). The use of the USXES enables to register the silicon Si L2,3–spectra providing the information about the local partial densities of Si s and d occupied states of silicon valence band in silicon‐contained materials. According to the simulation and fitting procedure to the experimental data, Fe3Si and a small amount of oxide (SiO2:H) were found in the interlayer of MLNS‐I. At the same time, the content of silicon dioxides (SiO2) decrease from surface layers to the deep ones. On the other hand, simulation of the phase composition of MLNS‐II reveals the presence of the silicides Fe3Si and Co2Si, oxides SiO2 and SiO1.3, and a small amount of a‐Si:H. The percentage of cobalt silicide Co2Si and suboxide SiO1.3 increased in the deep layers of the MLNS‐II.