Abstract
The oxidation resistance of pure Si and Si-HfO2 bond coats with three different compositions were investigated at 1300 ℃. The pure Si bond coat is easy to crack and exfoliate due to the volume expansion of SiO2 produced by the oxidation of Si and the transformation of β→α-cristobalite during cooling. While the 60Si-40HfO2 bond coat has excellent oxidation resistance at 1300 ℃ for 100 h, attributed to the oxidation product HfSiO4 consuming more SiO2 (the thickness of thermally grown oxide is 3.08 ± 0.36 µm), which inhibits the sharp increase of thermal stress of the bond coat.
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