Abstract
The hyperfine field at 181Ta lattice sites in a nanostructured Hf02 thin film was studied by the perturbed angular correlation (PAC) technique. The thin oxide film was deposited by pulsed laser ablation on a silicon substrate kept at 673 K. The thickness was about 25 nm. The radioactive 181Hf ions were produced by neutron activation of the very thin film in the Portuguese research reactor by the reaction 180Hf(n,γ)181Hf. PAC measurements were carried out at room temperature after annealing at different temperatures up to 1,473 K in air. The PAC technique allows determining the electric field gradient at the 181Ta probe sites. The 181Ta isotopes appear in the sample as disintegration product of 181 Hf.
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