Abstract
AbstractWe studied the role of a minor fraction of oxygen in nitrogen and argon downstream microwave plasma in view of plasma‐processing of ultrathin organic films ‐ self‐assembled monolayers (SAMs). As test systems we used SAMs of alkanethiolates on gold substrate. The plasma‐induced processes in the films, including their chemical modification, oxidation, and partial decomposition, were monitored in detail. These processes could be directly correlated with the presence of reactive, oxygen‐derived species in the plasma. The major plasma‐induced processes could be well described by the first order kinetics; the respective reaction rates were also derived. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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