Abstract
The perpendicular magnetization state is realized in Co-CoO film prepared by reactive RF sputtering in argon-oxygen mixture. With increasing the oxygen partial pressure, saturation magnetization of the deposited film decreases monotonically due to the formation of CoO. The film is composed of fine particles of hcp Co and fcc CoO. The perpendicular magnetic anisotropy energy and the coercivity reach to 3 × 106erg/cm3and 2 kOe, respectively. Above a critical partial pressure of oxygen, the deposited film has no spontaneous magnetization with a Co 3 O 4 single phase. The observed columnar structure in the Co-CoO film becomes fine with increasing the oxygen partial pressure. The exchange anisotropy is found in the Co-CoO film. The perpendicular magnetic anisotropy in the film is likely to be originated from an anisotropic assembly of ferromagnetic Co particles and antiferromagnetic CoO particles.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
