Abstract
A highly scalable perpendicularly magnetized storage layer of a spin-torque-switching magnetic random-access memory (STT-MRAM) was developed. This storage layer attains a perpendicular magnetic anisotropy (PMA) of above 0.9 erg/cm2 at a thickness of 2 nm. Such high PMA is suitable for pushing STT-MRAM technology beyond the 20 nm node. The key was to realize dual interfacial PMA at both the Ir/Co and FeB/MgO interfaces in the united structure of the storage layer. While a high PMA was retained, a high magnetoresistance ratio (100%) and a low resistance–area product (3.0 Ω µm2) were also achieved.
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