Abstract
In this work, the perpendicular magnetic anisotropy (PMA) was realized in Ta/Pd/Co2FeAl0.5Si0.5/MgO/Ta films, but not observed in Ta/Pd/Co2FeAl0.5Si0.5/Ta films without MgO cap layer. A strong PMA had been achieved for a thick Co2FeAl0.5Si0.5 layer about 4.8nm at the annealing temperature of 300°C. Inserted Pd layer between Ta and Co2FeAl0.5Si0.5 layers was crucial to obtain PMA in Ta/Pd/Co2FeAl0.5Si0.5/MgO/Ta structured films. However, the thickness of inserted Pd layer has no significant effect on the value (Keff) of PMA. The films annealed at 300°C remain a similar Keff of around 1.23×106erg/cm3 while the inserted Pd layer is beyond a critical thickness.
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