Perpendicular magnetic anisotropy at room-temperature in sputtered a-Si/Ni/a-Si layered structure with thick Ni (nickel) layers

Abstract

In the literature, a magnetic “easy” axis perpendicular to the film plane at room temperature (i.e., perpendicular magnetic anisotropy - PMA) has been reported in Ni (nickel) layers with thicknesses below ≈15 nm. In this work, we observed room-temperature PMA in a-Si/Ni/a-Si (where a-Si denotes amorphous silicon) thin film structures with nickel layer thicker than 15 nm. Two layered structures were prepared by DC/RF triode sputtering: [a-Si/Ni/a-Si] sandwich structure and [a-Si/Ni/a-Si]5 multilayer structure. The cross sectional STEM revealed uniform Ni layers with thicknesses of ≈17 nm in [a-Si/Ni/a-Si]5 – multilayer and ≈28 nm in [a-Si/Ni/a-Si] – single-layer whereas amorphous Si layers were ≈15 nm and 170 nm thick, respectively. An amorphous Ni–Si interphase was also observed in the layered structures. The XRD showed patterns for fcc-Ni with dominant (111) orientation. No other crystalline phases were observed in the XRD patterns. To our knowledge, there are no literature reports of easy magnetization direction perpendicular to the film plane at room temperature for Ni layers with thickness of ≈28 nm as presented in this work. The origin of PMA in a-Si/Ni/a-Si films may be mainly attributed to the magnetoelastic anisotropy whereas the secondary source of PMA is believed to be the surface anisotropy and magnetocrystalline anisotropy of [111] columnar grains. Amorphous silicon layers (substrate) do not have a well-defined lattice structure like crystalline substrates. Therefore, they do not induce strains in the nickel layers through lattice mismatch as in the case of epitaxy. The strains can be caused by other factors such as diffusion-induced strain, thermal expansion mismatch or intrinsic stresses during the growth process. These results could be important for applications in memory devices, sensors, logic chips, magneto-optic, magneto-electronic and spintronic devices and in fundamental research, as well as first step toward preparation and understanding of the PMA in thick nickel layers.