Peroxidase activity against guaiacol, NADH, chlorogenic acid, ferulic acid and coniferyl alcohol in root tips of Lotus japonicus and L. corniculatus grown under low pH and aluminium stress

Abstract

AbstractThe purpose of this study was to examine the impact of low pH and Al stress on the apoplastic production of H2O2 and POD activity against guaiacol, ferulic acid, coniferyl alcohol, NADH and chlorogenic acid in the root tip (RT) of two cultivars of Lotus corniculatus and the model Lotus japonicus Gifu, with the goal to determine the possible role of POD activity in proton and Al tolerance. Our results suggest that Lotus corniculatus cv. UFRGS is more tolerant to low pH and Al than cv. Draco due to the high POD activities involved in CW strengthening. The enzymatic response of Lotus japonicus Gifu is similar rather to the sensitive cultivar. On the other hand, in cvs Draco and Gifu low pH induced the activation of CW-modifying PODs, which is probably a component of the defence response of roots to the presence of toxic protons. Aluminium did not activate further these activities suggesting that defence response and acclimation to low pH confers also effective defence against Al toxicity in Lotus species. The activity of NADH-POD and CGA-POD were not affected significantly by exposure to low pH or Al. Al and pH induced drop in H2O2 production, which was more relevant in cv. Gifu and Draco than in cv. UFRGS is probably associated with enhanced activity of peroxidases involved in secondary CW metabolism utilizing H2O2 as an electron acceptor.