Abstract
A novel patterning method for perovskite thin films is developed by Dae-Hyeong Kim and co-workers, which is described in article number 1702902. The patterning method (spin-on-patterning) is based on the thermodynamically preferred dewetting behavior of the perovskite precursor solution during the spin-coating process. By using this method, a high-performance, ultrathin, and deformable perovskite-on-silicon multiplexed image sensor array is successfully achieved.
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