Abstract
A study of electrothermal excitation of micromachined silicon beams is reported. The temperature distribution is calculated as a function of the position of the transducer, resulting in stress in the structure which reduces the resonance frequency. Test samples are realized and measurements of resonance frequency, vibration shape and vibration amplitude are carried out. There is a satisfactory agreement between theory and experiment at small thermal stresses. Near the buckling load we find distinct deviations from theory which are ascribed to mechanical imperfections of the beams.
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