Performance of PF BL-13A, a vacuum ultraviolet and soft X-ray undulator beamline for studying organic thin films adsorbed on surfaces

Abstract

We report on the present status of a vacuum ultraviolet and soft X-ray undulator beamline, BL-13A, located at the Photon Factory. BL-13A is mainly dedicated to the study of organic thin films adsorbed on well-defined surfaces, using angle-resolved photoelectron spectroscopy (ARPES), X-ray photoelectron spectroscopy (XPS), and X-ray absorption spectroscopy (XAS). The photon-energy resolution (E/ΔE) is estimated to be about 10000 at a photon energy of 64 eV with an exit-slit width of 30 μm. The photon intensity is estimated to be 2.9 × 1012 to 5.6 × 108 photons/s for photon energies of 30-1600 eV with an exit-slit width of 100 μm at the ring current of 450 mA. An ultrahigh vacuum (UHV) chamber equipped with an electron-energy analyzer (Gamma Data/Scienta, SES 200) is used as the main end station for ARPES, XPS, and XAS measurements. A sample can be transferred from a UHV chamber for sample preparation or from a UHV chamber for the evaporation of organic materials. The sample-holder acceptors are equipped with a heating and cooling system. The overall electron-energy resolution is estimated to be about 12 meV at a photon energy of 30 eV.