Abstract
AbstractWe report the performance of a 1 eV GaNAsSb photovoltaic cell grown on Si/Si–Ge substrate using molecular beam epitaxy at different growth temperatures. The sample grown at 420°C showed the highest energy conversion efficiency, with a short circuit current of 18 mA/cm2 and open circuit voltage of 0.53 V. With different growth temperature, performance of the cells degrade, which is attributed to the increase of nitrogen‐related defects and the decrease of antimony incorporation at higher growth temperature. Copyright © 2017 John Wiley & Sons, Ltd.
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