Performance investigation of doped multi-layer graphene nanoribbon as interconnects in modern technology nodes

Abstract

In this paper, the performance of intercalation doped multilayer graphene nanoribbons (MLGNR) with modern technology nodes is meticulously investigated. An unconditionally stable FDTD method is used to analyze the transient output of the circuit. Several cases of MLGNR interconnects under different doping materials, stacking directions and contact modes have been discussed. With multiple experiments carried out, it is shown that the Li-doped MLGNR interconnect with vertical stacking orientation has the most outstanding performance, which has the least delay compared with the traditional Cu interconnect and other counterparts in 3-nm and 5-nm nodes. In summary, the Li-doped vertically stacked MLGNR is very promising for carbon nano interconnects in the next generation of integrated circuits.