Abstract

The deep sub-micron (DSM) process nodes are increasingly marred by layout-dependent effects. The principal reason preventing layout synthesis during circuit design is the cost of edition, verification and extraction of the intermediate solutions repeatedly. This paper proposes a circuit and layout co-optimization scheme through a novel parasitic model-building scheme that exchanges information between the two flows. A placement-based parasitic estimation method to provide parasitic estimations to schematic optimization tools while retaining their efficiency. Extracted parasitics and simulated performance data are imparted into parasitic macro-devices and performance sensitivities. As proved by experimental results, the flexibility of the parasitic models bridges the efficiency and accuracy void between schematic and physical design optimization to ensure rapid DSM design closure.

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