Abstract

The terahertz (THz) frequency range is incredibly important as it covers electromagnetic emissions typical for biological and molecular processes. All molecules emit THz waves in a unique fingerprint pattern, although the intensity of such signals is usually too weak to be detected. To address the efficiency gap in existing THz devices it is extremely important to create surfaces with perfect anti-reflection properties. Although metals are absolutely reflective, here we show both theoretically and experimentally that by constructing meta-surfaces made of a superposition of ultra-thin metallic nano-films (a couple of nanometres thick) and oxide layers a unique property of perfect transmission and impedance matching may be realised. The perfect transmission rates can be as high as 100% and it may be achieved in both optical and THz regimes. The predicted effect has been observed for numerous meta-surfaces of different compositions. The effect found here is expected to impact the renewable energies sectors, optoelectronic and telecommunication industries, accelerating the arrival of the sensors for the new 6G-technology. The phenomenon is highly relevant to all scientific fields where minimising electromagnetic losses through reflection is important.

Highlights

  • Recent research into antireflective coatings made of multilayer structures of dielectric films has shown that it is possible to obtain very low levels of THz light reflection [1], opening up a new direction in nano-photonics with a broad potential for diverse applications

  • In order to evaluate the predictions of refractive index matching or 100% anti-reflection and transmission in metal nano-film capped multilayer structures, we have designed, fabricated and tested a series of devices or samples

  • In these hybrid with nano-films made up of two types of materials Ge and Sn—Si/Al2O3/Ge/Sn. In these hybrid metameta-surfaces, the metal nano-film is replaced by a combination of Ge and Sn layers of equal thicknesses surfaces, the metal nano-film is replaced by a combination of Ge and Sn layers of equal thicknesses deposited onto a 60-nm oxide layer of Al2 O3

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Summary

Introduction

Recent research into antireflective coatings made of multilayer structures of dielectric films has shown that it is possible to obtain very low levels of THz light reflection [1], opening up a new direction in nano-photonics with a broad potential for diverse applications. Despite the substantial success in current approaches to decrease the THz light reflection, obtaining surfaces with 100% anti-reflection and transmission rates still remains one of the main obstacles in the construction of perfect optical devices such as flat Veselago–Pendry lenses. Similar trends have been observed in graphene covered by a thin film of colloidal quantum dots, where extremely strong photoelectric effect provides enormous gain for photo-detection (about 108 electrons per photon) [3]. By realising materials with perfect THz anti-reflection properties, the existing THz

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