Abstract
A comparative experimental study is conducted of nanocrystalline-and porous-silicon films from the viewpoint of their structural, luminescent, and optical properties, the films being fabricated by PECVD and electrochemical etching, respectively. The x-ray-diffraction data obtained imply that the PECVD films consist of nanocrystals that are uniformly (004) oriented and measure on average 4.8 nm across. It is shown by an AFM investigation that the films have a very rough surface occupied by sharply pointed nanoscale asperities. The films can exhibit room-temperature photoluminescence that is strongest at a photon energy of 1.55 eV. Optical properties of the nanocrystalline-and porous-silicon films are examined in the visible range and the IR. The nanocrystalline-silicon films are found to have similar physical and chemical properties to the porous-silicon films.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
