Abstract
Thin boron carbonitride films were grown by plasma enhanced chemical vapour deposition using mixture of N-trimethylborazine with ammonia or hydrogen. The thermodynamic analysis of the chemical vapour deposition in B-C-N-H system was carried out for temperatures from 300 to 1300 K, a total pressure from 1.33 to 1333 Pa and a wide range of values of H2:B3N3H3(CH3)3 and NH3:B3N3H3(CH3)3 ratios. The effect of the gas phase composition and substrate temperature on the chemical composition and optical properties of the deposits was studied by ellipsometry, scanning electron microscopy, IR-spectroscopy, and optical transmittance spectrophotometry. The low temperature boron carbonitride films were demonstrated to exhibit high optical transparency in the region of 400-2000 nm (transmittance up to 93 %).
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