Patterning without polymers

Abstract

Lithography Nanoscale patterning usually requires multiple steps to mask, pattern, and develop sequential layers. One overriding concern is to obtain compatibility between all the materials, as well as the patterning techniques used, to ensure accurate and clean processing. Wang et al. use light-responsive ligands to change the solubility of nanocrystals in specific solvents, so that development can be done by simple redispersion of nanocrystals in dark regions (see the Perspective by Striccoli). The process can fully utilize the advantages of conventional semiconductor processing, but without the need for photoresists, because the nanocrystals are only deposited where they are exposed to light. Science , this issue p. [385][1]; see also p. [353][2] [1]: /lookup/doi/10.1126/science.aan2958 [2]: /lookup/doi/10.1126/science.aan8430