Patterning of structures by e-beam lithography and ion etching for gas sensor applications

Abstract

This work deals with a method of preparation of nanometer structures for a gas detector based on e-beam lithography and ion etching of a thin TiO2 film. The aim was the fabrication of a gas sensor with meander or comb structures of nanometer dimensions. This is of importance since both the size of the contacts and the layer thickness affect the sensor's sensitivity.