Patterning of sol gel thin films by capillary force assisted soft lithographic technique

Abstract

Patterning of sol gel based silica and silica–titania films has been developed at room temperature by soft lithographic technique. Corresponding metal alkoxides have been utilized for the preparation of precursor sols. Elastomeric stamps of polydimethylsiloxane (PDMS) are used to emboss patterns of a master grating on the as-prepared silica and silica–titania films obtained by sol gel process. Pressure-less capillary force lithography has been used to fabricate both 1-D and 2-D ordered structures of simple stripe patterns. A modified solvent assisted lithography and micro-molding in capillaries yielded stable and high fidelity 1-D structures for silica and silica–titania films over a large area.