Abstract
Lead-halide perovskites have attracted great attention due to their excellent optoelectronic properties, with rapid progress being made in their performance as light-emitting diodes (LEDs), photodiodes, and solar cells. Demonstrating large scale, high-resolution patterning of perovskites is a key enabling step to unlock their full potential for a range of optoelectronic applications. However, the development of a successful top-down lithography fabrication procedure has so far been hampered by the incompatibility of perovskite films with the solvents used during lithographic processes. Here, we perform a study on the effect of different lithographic solvents on perovskite films and use this insight to develop photolithography and electron-beam lithography procedures for patterning perovskite films. This procedure uses standard resists at low temperatures and achieves micron-scale features with flat tops. Furthermore, we expand this platform to produce arrays of multicolor pixels for potential commercial perovskite LED display applications.
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