Patterning and metallization of silicon solar cells by inkjet-printed functional ink on a photoresist layer

Abstract

This paper reports a patterning and metallization method for silicon solar cells fabrications. Patterning was achieved by the inkjet printing of a dye-based ink as a mask to protect the photoresist from UV-light initiated crosslinking. The patterned photoresist was used to facilitate the etching of a pattern in the underlying dielectric layer and also to act as a metal plating mask. This method resulted in fine point openings in the photoresist layer with a diameter of 15 µm and line openings with a width of 30 µm. Nickel/copper plated homogeneous emitter silicon solar cells with an efficiency of 18.2% on small size Cz wafers were fabricated using this method, may find applications in the metallization of future heterojunction, rear contact and PERC cells.