Patterned immobilisation of silicon dioxide nanoparticles on the surface of a photosensitive polymer

Abstract

A photosensitive co-polymer of styrene and 4-vinylbenzyl thiocyanate was synthesised and employed for the immobilisation of aminofunctionalised silica nanoparticles (SiO 2-NP) at the polymer surface. Upon UV irradiation of the co-polymer, isothiocyanate groups are generated by a photo-isomerisation reaction of the thiocyanate groups. The silica nanoparticles were selectively immobilised in irradiated areas by immersing the illuminated polymer surface in a solution of SiO 2-NP. Depending on the time of immersion and the nanoparticle concentration, different amounts of silica can be deposited in the irradiated areas, whilst no immobilisation of SiO 2-NP is observed in the non-irradiated areas. By using photolithographic methods, patterned silica structures (μm scale) were produced on the polymer surface. The SiO 2-NP covered surfaces are of potential interest to generate protective surface layers and to carry out further functionalisation reactions of the immobilised SiO 2-NP particles.