Abstract
AbstractFor the first time, patterned growth of boron nitride nanotubes (BNNTs) on Si substrates has been achieved by catalytic chemical vapor deposition (CCVD). Following the boron oxide chemical pathway and our growth vapor trapping approach, high quality and quantity BNNTs can be produced. Effective catalysts have been found to facilitate the growth of BNNTs, while some critical parameters of the synthesis have also been identified to control the quality and density. The success of patterned growth of high quality BNNTs not only explains the roles of the effective catalysts during the synthesis process, but could also be of technologically important for future device fabrication.
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