Pattern Transfer of 1μm Sized Microgap and Microbridge Electrode for Application in Biomedical Nano-Diagnostics

Abstract

We present a new design of biochip for application in clinical diagnostics by using a conventional method of pattern transfer process in microelectronic fabrication. Although there are many advanced techniques available to produce nanostructures such as electron beam lithography (EBL), ion-beam lithography (IBL), focused ion beam milling and nanoimprint lithography, these methods often requires high maintenance costs, time consuming and very complicated compared to conventional photolithography. This conventional technique is still a good choice for a feature size more than 1 micron. In this work, microbridge and microgap design from chrome mask are transferred on silicon wafer to fabricate a biochip. The pattern transfer of the first mask of electrode is presented in this paper to test the repeatability of pattern transfer during photolithography process. Therefore, during the process, the resolution and precise alignment factors are taken into account to prevent circuit and device failure. Post-exposure bake time and development limitations are recorded for both designs.