Pattern Generation by Using Multistep Room-Temperature Nanoimprint Lithography

Abstract

We have demonstrated multistep room-temperature nanoimprint lithography (RTNIL) using polystyrene (PS, average molecular weight 97 kg/mol) as the imprint polymer layer on a silicon substrate for imprinting complex patterns. Single, double, and multiple (up to ten) sequential imprint steps were performed at imprint pressures between 1 to 30 MPa in separate experiments. We also transferred the imprinted patterns from the PS layer into the silicon substrate by means of an reactive-ion etching (RIE) process. To accomplish this demonstration, we designed and built a tool that controllably and repeatedly translated and pressed a sample into a stationary mold. The demonstrated interstep alignment accuracy of this tool ranged between 80 nm and 380 nm. These experiments revealed that polymer deformation results when nanoimprint is used to further deform a previously structured surface. The molds used in these experiments consisted of 400-nm-period diffraction gratings, as well as of rectangular structures of varying aspect ratios, ranging from 150 to 300 nm wide.