Abstract
A nanopatterning fabrication by soft X‐ray generated chemical construction of a polystyrene benzaldehydeimine monolayer has been carried out from the polystyrenebezaldehyde resin with (3‐aminopropyl) triethoxysilane for the first time. The molecular layer was exposed to soft X‐rays; the involved chemical modification on the monolayer was analyzed by using Fourier transform infrared spectroscopy‐attenuated total internal reflectance and contact angle measurement. As a result, we could confirm that the imine monolayer was cleaved upon the soft X‐ray irradiation, leaving the hydrophobic part, the imine functionality was changed into a new nonhydrolysable, and the hydrophilic amine functionality was established from the unexposed imine monolayer through acid hydrolysis. This above phenomenon is used for the patterning of self‐assembled monolayers. The microscope images revealed patterns as small as ≤52.4 nm with regular height and phase variations.
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