Abstract
<sec>In this paper, we propose a passive near-field scanning imaging system by using the structure of cadmium sulfide (CdS) nanowire/tapered microfiber probe, which combines the near-field scanning structure and the nanowire/microfiber coupling technology. In the passive near-field scanning imaging system, a passive nanoprobe is adopted to detect the intensity change of the reflected light field on the sample surface, which not only retains the advantage of the nanoprobe for the strong restriction of the reflected light on the sample surface, but also reduces the interference of strong excitation light during detection. Through the high efficiently evanescent field coupling between the CdS nanowire and the tapered microfiber, the collected light signal is transmitted to the photodetector in the far field, and finally the imaging of the target sample morphology can be realized.</sec><sec>At first, the light field model of the nanowire/tapered microfiber probe structure is verified by the finite element analysis method. The calculated collection efficiency from the sample to the probe is about 4.65‰ and the transmission efficiency from the nanowire to the tapered microfiber is about 74.47%. The collection efficiency is improved by an order of magnitude compared with traditional metal-coated near-field probe. In the experiments, a scanning step of 20 nm and a probe-sample distance of 230 nm are selected. The nanowire/tapered microfiber probe and traditional tapered fiber probe are both used to measure the widths of different CdSe nanoribbons samples, and the atomic force microscopy measurement is used as the benchmark to calculate their measurement error, which is increased about 3 times. By changing the angle <i>θ</i> between the probe and the sample, it is found that the resolution obtained using the designed nanowire/microfiber probe is always higher than only using the tapered microfiber probe. Comparing with the tapered microfiber probe scheme, the measurement error is reduced to a value less than 7.2%.</sec><sec>In addition, compared with the active luminescence probe scheme, this passive near-field scanning scheme reduces the preparation complexity of the optical probe and the detection structure complexity of the optical system. The large microscopic illumination area can avoid the influence of the small laser spot size on imaging, and the imaging range is determined only by the travel distance of the linear stage. Therefore, our work may provide an attractive approach for developing new near-field scanning microscopy systems in the future.</sec>
Highlights
In this paper, we propose a passive near-field scanning imaging system by using the structure of cadmium sulfide (CdS) nanowire/tapered microfiber probe, which combines the near-field scanning structure and the nanowire/microfiber coupling technology
1) (School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China)
Summary
图 1 被动式近场光学扫描成像系统 (a) 系统原理图; (b) 显微照明–成像部分原理图; (c) CdS 纳米线/锥形微光纤探针. HC:主 机, DMC:位移控制器, PZT:压电位移台, 3D stage: 维线性位移台, LS:照明光源, PD:光电转换器, EM:电放大器, OSC:示波器 Fig. 1. Passive near-field optical scanning imaging system: (a) Schematic diagram of the system; (b) schematic diagram of illumination-imaging part; (c) CdS nanowire/tapered microfiber structure. HC: host computer, DMC: displacement controller, PZT: piezo translation stage, LS: lighting source, 3D stage:3D linear stage, PD: photodetector, EM: electrical amplifier, OSC: oscilloscope. 仿真得到无样品覆盖区及样品覆盖区的反射率如 图 2(a) 所示, 可见硅基底具有更高的光反射能力, 图 2(b) 为距样品表面 300 nm 处水平面的光场分布 , 该时域有限差分法 (finite difference time domainmethod, FDTD) 仿真也验证了上述理论. FDTD 模拟的光源 为波长 600 nm 的圆偏振光, 探针由折射率为 1.46 的二氧化硅锥形光纤和折射率为 2.52 的 CdS 纳米 线组成, 样品是折射率为 2.67 的硒化镉 (cadmium selenide, CdSe) 纳米带, 基底是折射率为 3.95 的 硅. 此外, 还分析了光信号从纳米线端部到锥形光 纤的传输特性, 根据 AFM 测量结果, 仿真所用 CdS 纳米线宽度为 350 nm, 高度为 65 nm. 图 3(b) 展示了纳米线/锥形微光纤探针-样品 间不同的间距对扫描结果的影响. 在探针-样品间 距从 900 nm 减小至 130 nm 过程中, 边界的光强 变化越来越明显. 间距过大时, 样品细节极易淹没 在背景噪声中; 间距过小时, 探针与样品易因范德 华力和静电力吸附在一起. 同样由于 130 和 230 nm 间距条件下的扫描成像结果类似, 为了兼顾检测难 度和精度, 实验选取探针-样品间距为 230 nm
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