Abstract

Reflection‐extended x‐ray absorption fine‐structure spectroscopy has been used to probe the local atomic structure of the passive film of supersaturated Al‐Mo alloys polarized in . These alloys (with 7–11 atom percent Mo) exhibit resistance to localized attack with an increase in the pitting potential of ∼600 mV relative to pure aluminum. Measurements show that the structure of the Al‐Mo passive films resembles that of , whereas an oxide film grown on pure Al in tartaric acid, which does not possess enhanced passivity, is more like . Complementary x‐ray photoelectron spectroscopy measurements indicate the Al‐Mo passive film composition to be near that of and the tartaric‐acid film to be . Because corundum and diaspore , which contain only octahedrally coordinated Al atoms, are very stable and inert while , which contains both octahedral and tetrahedral sites, is reactive, the change in structure of the passive film suggests that improved passivity may be correlated with a reduction in the density of tetrahedrally coordinated atoms. This structural change likely results from the incorporation of oxidized Mo into the passive film; only as this Mo is hydrated with a presumed change in local structure does the alloy pit.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call