Abstract
Oxygen vacancies (VO) often exist in wide-bandgap metal oxide semiconductors (MOSs) as deep-level defects and undermine the reliability of various optoelectronic devices based on MOSs. Conventional methods to passivate VO defects, such as high-temperature annealing or plasma treatment, can compromise device performance. This work demonstrates that passivation of VO defects in aluminum-doped ZnO (AZO) nanoparticles can be realized through low-temperature annealing (350 °C) in an NF3 atmosphere. After the NF3 annealing, the longitudinal optical phonon scattering mode in Raman spectroscopy, the visible light emission intensity in photoluminescence spectroscopy, and the oxygen deficiency-related peak in x-ray photoelectron spectroscopy decrease simultaneously, indicating the passivation of VO defects in AZO nanoparticles. As a result, AZO nanoparticles show higher visible light reflectance and better stability of electrical conductivity owing to the suppression of deep-level light absorption and gas molecule adsorption. This work also offers insights into the passivation mechanism of VO defects in MOSs.
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