Abstract

Particle‐precipitation‐aided chemical vapor deposition (PP‐CVD) is a modification of the conventional CVD process, where an aerosol is formed in the gas phase and particles are deposited on a substrate. The driving force for particle deposition is thermophoresis. The synthesis of titanium nitride (TiN) has been studied. TiN is formed on the substrate, as well as in the gas phase. At low temperature differences, only dense microstructures with equiaxed grains are observed; porous coherent layers are found in experiments where larger temperature differences are applied. Additional increase in the temperature difference only leads to loose powder deposits. In principle, the PP‐CVD process is a suitable method for the synthesis of thin porous layers of ceramics.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.