Particle-in-cell simulations of EUV-induced hydrogen plasma in the vicinity of a reflective mirror

Abstract

Particle-In-Cell (PIC) simulations were performed in this work to study the dynamics of the EUV-induced hydrogen plasma. The Monte-Carlo Collision (MCC) model was employed to deal with the collisions between charged particles and background gas molecules. The dynamic evolution of the plasma sheath, as well as the flux and energy distribution of ions impacting on the mirror surface, was discussed. It was found that the emission of secondary electrons under the EUV irradiation on the ruthenium mirror coating creates a positively charged wall and then prevents the ions from impacting on the mirror and therefore changes the flux and energy distribution of ions reaching the mirror. Furthermore, gas pressure has a notable effect on the plasma sheath and the characteristics of the ions impinging on the mirrors. With greater gas pressure, the sheath potential decreases more rapidly. The flux of ions received by the mirror grows approximately linearly and at the same time the energy corresponding to the peak flux decreases slightly. However, the EUV source intensity barely changes the sheath potential, and its influence on the ion impact is mainly limited to the approximate linear increase in ion flux.