Abstract
We present a general numerical framework for modeling plasma processing devices. Based on the particle-in-cell method, in which any material can be represented by particles, we model plasmas, fluids, dust particles and structures, and their interactions. We define classes of particles, each of which represents a different material, and each of which is hosted by an independent code module. For example, an object module represents structures and imposes boundary conditions corresponding to complex geometries on to the plasma and fluid particles. We describe the formulation of PIC for a drift-diffusion model, calculate the interaction with dielectrics and conductors, compare the results of the code with calculations of DC discharges, and present an example that illustrates the geometric complexity that can be modeled. >
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