Abstract
Neutral beam processing is being considered as a new technique to reduce plasma-induced damage in materials processing. We report on particle-in-cell simulations of a neutral beam source. The system is composed of an ion-beam source and multireflectors which neutralize incident ions and reflect neutral particles. It is revealed from the simulations that about 2.8% of the ion-current from an ion-beam source is successfully neutralized before reaching a diagnostic plate.
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Schedule a callMore From: IEEE transactions on plasma science. IEEE Nuclear and Plasma Sciences Society
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