Abstract
Optical elements at potential represent a serious concern for particle generation in ion implanters. Conditioning of acceleration columns is a well known phenomenon in accelerators but less well known is the fact that the microdischarging, which accompanies the conditioning process, results in high particle production. All elements at voltage will exhibit microdischarging, but careful design can greatly reduce it and control the associated particle generation. Moreover, microdischarging can be detected, so that the implanter control system can detect and interlock recipes against microdischarge generated particulate contamination.
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