Abstract
Abstract We performed investigations on energy distributions of ions and neutrals generated during argon and krypton ion beam sputtering of titanium and boron nitride using a modified energy selective mass spectrometer. During the process, we measured the secondary particle energy and angle distribution and estimated a “differential sputter yield” which gives a semi-quantitative, angle-resolved number of sputtered particles per incident ion. Sputtering was performed in the low-energy range between 20 eV and 1200 eV at a 90° fixed angle between the sputtering source and the detector system. In addition, a detector–tilt system was developed for angle-resolved measurements. Dependent on the primary ion energy, backscattered and resputtered process gas ions with clearly different energy distributions were detected.
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