Abstract
An in-situ measurement system for particles in an electron beam (EB) writer is developed to improve mask yield management. The system has satisfied the required installation specifications for a mask blank inspection system for the EB writer, and the results of an experiment using the system prove that particles added from the mask handling system in our EB writer satisfy the total particle count specification (<1.25 counts/cycle for 6 inch mask). The investigation of particle increase after repeated mask movement has been carried out in each segmented mask handling route. It has been clarified that the segmentation test using this system is helpful for investigation of the origin of particle production on a mask. Effective application of information such as particle position and size obtained by this system will be very useful for improving mask yield management in the mask fabrication process in terms of pattern inspection and repair system.
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