Abstract
ABSTRACTWe performed a parametric study to suppress secondary phases in lithium niobate thin films by using pulsed laser deposition (PLD). A KrF excimer laser (λ=248nm) was used as a PLD source and c-oriented sapphire was used as substrates, for waveguide applications. By reducing the growth rate and changing the ambient gas pressure respectively, we found that the main parameter suppressing a secondary phase is controlling the plume strength. To investigate the relation between film phases and the plume strength, extensive parametric studies were performed by changing the oxygen ambient pressure, the target to substrate distance, and also the Li content in the target. The surface morphologies of single phase films and Li-deficient phase mixed films are compared and related to the growth mechanism with a lattice misfit. Deposition parameters to achieve lower loss films are also discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
