Abstract
A study of the electrophysical parameters of plasma and the kinetics of plasma-chemical processes in CF4 + H2 + Ar mixture by varying the CF4/H2 ratio were carried out. Using diagnostic methods and plasma modeling together, it was found that replacing tetrafluoromethane with hydrogen a) leads to a decrease in plasma density and an increase in electronegativity; and b) causes a disproportionately sharp drop in the concentration of fluorine atoms. The reason for the latter effect is an increase in the frequency of death of atoms in reactions of the form CHFx + F → CFx + HF, initiated by heterogeneous recombination according to the CFx + H → CHFx mechanism. A simultaneous increase in the concentration of polymer-forming radicals CHxFy (x + y 3) indicates an increase in the polymerization load of the plasma on the surfaces in contact with it.
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