Parameter tuning of PVD process based on artificial intelligence technique

Abstract

In this study, an artificial intelligence technique is proposed to be implemented in the parameter tuning of a PVD process. Due to its previous adaptation in similar optimization problems, genetic algorithm (GA) is selected to optimize the parameter tuning of the RF magnetron sputtering process. The most optimized parameter combination obtained from GA’s optimization result is expected to produce the desirable zinc oxide (ZnO) thin film from the sputtering process. The parameters involved in this study were RF power, deposition time and substrate temperature. The algorithm was tested to optimize the 25 datasets of parameter combinations. The results from the computational experiment were then compared with the actual result from the laboratory experiment. Based on the comparison, GA had shown that the algorithm was reliable to optimize the parameter combination before the parameter tuning could be done to the RF magnetron sputtering machine. In order to verify the result of GA, the algorithm was also been compared to other well known optimization algorithms, which were, particle swarm optimization (PSO) and gravitational search algorithm (GSA). The results had shown that GA was reliable in solving this RF magnetron sputtering process parameter tuning problem. GA had shown better accuracy in the optimization based on the fitness evaluation.