Abstract
Polysulfone-based membranes with excellent chemical resistance and a wet thickness up to 200 μm are obtained via UV curing of unmodified polymers after careful tuning of the photoinitiating system and the crosslinker structure. Combinations of photoinitiator and crosslinker are studied in depth, followed by a characterization of the formed macromolecular structure. The performance of the resulting membranes is then evaluated through long-term immersion in solvents. Classical depth-curing acyl phosphine oxide-based photoinitiators in combination with a pentaacrylate crosslinker are found to be the optimal system.
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