Abstract
Using an integrated airbridge and submicrometer gate post technology, coupled quantum point contacts (QPCs) arranged in a parallel configuration were fabricated. The airbridge and gate post are fabricated by e-beam lithography and Ti/Au evaporation in a single step. Gate post diameters as small as 0.1 μm have been achieved. The two QPCs are fabricated with two conventional gates and a central airbridged gate, each of which can be biased independently. Conductance measurements clearly exhibit coupling of the two QPCs, as the quantized conductance steps are in units of 4 e2/h. Independent measurements of each QPC show conductance steps in units of 2 e2/h.
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