Abstract
Tip-based nanolithography provides a flexible nanolithographic technology. Tip fabrication is one of the main challenges. In this paper, we propose to combine the dry etching of photoresist and electro-chemical machining to reduce the size of the tip opening. We successfully fabricate a tip opening with a diameter of 200 nm. After lithography and lift-off, gold dot patterns with a diameter of 280 nm are demonstrated. Moreover, a home-made multi-step exposure system is built and both the successful 14- and 44-step nanolithography by a tip array are also demonstrated in the paper.
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