Abstract
Contact properties of Palladium (Pd) on the surface of hydrogen-terminated single crystal diamond were investigated with several treatment conditions. 150nm Pd pad was deposited on diamond surface by thermal evaporation technique, which shows good Ohmic properties with the specific contact resistivity (ρc) of 1.8×10−6Ωcm2 evaluated by Transmission Line Model. To identify the thermal stability, the sample was annealed in Ar ambient from 300 to 700°C for 3min at each temperature. As the temperature increased, ρc firstly decreased to 4.93×10−7Ωcm2 at 400°C and then increased. The barrier height was evaluated to be −0.15eV and −0.03eV for as-deposited and 700°C annealed sample by X-ray photoelectron spectroscopy analysis. Several surface treatments were also carried out to determine their effect on ρc, among which HNO3 vapor treated sample indicates a lower value of 5.32×10−6Ωcm2.
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