Abstract

In this paper, the advanced monitoring technology for Ion Implanter using Microwave Photoconductive Response (u‐PCR) is presented. The new monitoring method is able to be considered through the real LTPS (Low Temperature Poly Silicon) process like excimer laser annealing, ion doping and thermal activation at large size glass. The u‐PCR method expects to be able to evaluate the solid state reaction of poly silicon and substitute the present monitoring method which is manually measured a wafer doped by RTA.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.